PVD-Magnetron Sputtering | PLASMIONIQUE

PVD TURN-KEY SYSTEMS

Plasmionique's PVD systems are highly versatile semi-automated or fully automated customized systems integrating a variety of Physical Vapour Deposition technologies. All systems are controlled by our PLASMICON proprietary control system.

The MAGNION Series of sputter deposition systems are turn-key units customized to fit the end users' requirements. They are highly versatile with fully integrated control and data acquisition systems.

Plasmionique’s proprietary MAGNION Series sputtering cathodes are designed for high target utilization efficiency, and are available in balanced and unbalanced magnetic configurations in circular or rectangular shapes. The magnetron cathodes are able to operate in DC, pulse-DC, AC or RF biasing modes.

Optionally, these systems can include a PLUME series remote plasma source for Enhanced Reactive Sputter Deposition. Substrate rotation, heating, biasing, and computer controlled axial motions are options available on all systems.

The MAGNION Series Systems are also offered as :

Hybrid Deposition Systems

Roll-to-Roll Deposition Systems

Tabletop and Compact Deposition Systems

MAGNION Series

MAGNETRON OR ION-BEAM SPUTTER DEPOSITION SYSTEMS

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Typical Sputtering System Characteristics

MAGNION Sputtering Magnetrons

Substrate/Sample Mount

Process Environment

Substrate/ Sample Mount

Magnetrons/Plasma Sources

Utility Requirements

Target sizes circular 1”, 2”, 3”, 4” diameter, or rectangular
Operation with RF(13.56 MHz) DC or Pulsed-DC
Balanced or unbalanced magnetic geometries
Cross-contamination shields and shutters
Option for adjustable axial position or head angle

User defined mount size/shape
Heating to over 850 ºC with PID temperature control or cooling
Motorized sample rotation and axial translation
Biasing (RF or DC) available
Load-lock sample transfer station (optional)

Stainless steel chamber, vertical or horizontal cylindrical
Access door or split chamber design
Vacuum to 10-8 Torr range with turbomolecular pump backed with rotary vane or dry scroll mechanical pump
Operation with oxygen or corrosive gases (optional)
Vacuum gauges: wide-range gauge and capacitance manometer for process pressure control
FLOCON Series Gas management system for multiple gases or vapors, with mass flow controllers, fully automatic and programmable to tailor the gas mix
User defined number of Mass Flow Controllers with shut-off valves
Purge/vent line with safety pressure relief valve

User defined sample size/shape
Heating to over 850 ºC with PID temperature control or cooling
Motorized rotation and axial translation motorized or manual
Biasing (RF or DC) available
Load-lock sample transfer station (optional)

Target sizes circular 1”, 2”, 3”, 4” diameter, or rectangular
Operation with RF(13.56 MHz) DC or Pulse-DC
Balanced or unbalanced magnetic geometries
Cross-contamination shields and shutters
Option for adjustable axial position or head angle

Electrical: typically 60/50Hz, 120 single-phase to 380V 3-phase, 5-wire
Cooling water: typically 1-4 gpm, 17-30 ºC, system dependent
Instrument air: 40-80 psig (3-5 bar)
Purge/vent gas, regulated
Process gases, regulated

Information / Quote Request