ION IMPLANTATION SYSTEMS

Plasma-Based Ion Implanters are an economical and versatile substitute for surface engineering applications, as well as shallow depth doping for nanoelectronics and photonics applications. The plasma-immersed ion implantation process is a conformal surface treatment and allows deposition on structures having 3D topography.

PLASMIONIQUE’s PUPION series, PUlsed Plasma ION implanters, can operate with a continuous working (CW) plasma and a pulsed substrate bias voltage or with constant bias and a pulsed plasma.  The pulsed plasma option is particularly useful when mono-energetic ion implantation is critical. 

PUPION systems have a demonstrated ability to minimize contamination during implantation of radioisotopes.

 

A variety of plasma excitation techniques are offered, depending on the required application. The systems are fully computer controlled and an integrated data acquisition system for real-time process parameter monitoring as well as data logging are also included.

Typically, voltages up to 10 kV are used.

PUPION Series

PULSED PLASMA ION IMPLANTER

 Toll free Phone: +1 833 8 PLASMA    Fax: +1 833 875 2762    E-mail: info@plasmionique.com
Copyright © 2018 Plasmionique Inc. All rights reserved.

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