PLASMIONIQUE’s PUPION series, PUlsed Plasma ION implanters, can operate with a continuous working (CW) plasma and a pulsed substrate bias voltage or with constant bias and a pulsed plasma. The pulsed plasma option is particularly useful when mono-energetic ion implantation is critical.
PUPION systems have a demonstrated ability to minimize contamination during implantation of radioisotopes.
A variety of plasma excitation techniques are offered, depending on the required application. The systems are fully computer controlled and an integrated data acquisition system for real-time process parameter monitoring as well as data logging are also included.
Typically, voltages up to 10 kV are used.
