Form-PVD | PLASMIONIQUE 2019

Full Name

Affiliation and Position

PVD Selection Guide

Phone

General

General Description of Application

Deposition Technique

Magnetron Sputtering

Pulsed Laser Deposition

Thermal Evaporation (incl. e-beam)

Hybride System

Porte-substrat

Pour le choix d'un mouvement planétaire, veuillez indiquer

Number of Substrate Slots on Carousel

Substrate Size (include units)

Fixed Distance or Variable Range (include units)

Heating or Cooling Needs

Magnetron Options (if applicable)

For Circular Magnetrons

For Custom Rectangular Magnetrons

Magnetron Target Dimensions (include units)

Number of Magnetrons

Number of RF Power Supplies

Number of DC Power Supplies

Number of Pulsing DC Power Supplies

Required if a single power supply is to be used by more than one magnetron

Pulsed Laser Deposition Options (if applicable)

Number of PLD Targets on Carousel

Thermal Evaporation Options (if applicable)

Number of Thermal Boats

Thermal Boat Capacity (include units)

Number of Boat Power Supplies

Number of e-Beam Crucibles

e-Beam Crucible Capacity (include units)

Number of e-Beam Power Supplies

Number of Low Temp. Evaporators

Low Temp. Evaporator Capacity (include units)

Number of Low Temp. Evaporator Power Supplies

Required if a single power supply is to be used by more than one source

Additional Options

Number of Gas Lines

Remote Plasma Source Diamater (include units)

An additional gas injection ring at the source exit improves performance in PECVD applications with reactive gases that have the potential of forming conductive coatings.

Number of QCMs

Quartz Crystal Microbalances can be used for rate and thickness monitoring during depositions.

Other Comments

Thank you for your inquiry.

We will be in touch as soon as possible.