Form-Plasma Reactor | PLASMIONIQUE 2019

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Plasma Reactor Selection Guide

Full Name

Affiliation and Position

Email

Phone

General

Application

General Description of Application

Process

Techniques

ICP

CCP

Maximum RF Power (in watts)

Between 120W and 3000W

Substrate Holder Options

Substrate Size (in inches)

Substrate Motion Option

Substrate Motion Option

Biasing Voltage (in volts)

Heating or Cooling Needs

He Backplate

Gas Flow and Pressure Control

Number of Gas Lines

Include Loadlock?

Maximum Gas Flow Per Line (in units of sccm)

Pump Gate Valve

Loadlock Transfer

Mechanical Pump

Process Pressure Range (include units)

Turbomolecular Pump Required?

Residual Pressure (include units)

Other Options

Optical Emission Spectrometer

Additional Comments

Thank you for your inquiry.

We will be in touch as soon as possible.

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