Form-Plasma Reactor | PLASMIONIQUE 2019

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Plasma Reactor Selection Guide

Full Name

Affiliation and Position

Email

Phone

General

General Description of Application

Techniques

ICP

CCP

Maximum RF Power (in watts)

Between 120W and 3000W

Substrate Holder Options

Substrate Size (in inches)

Biasing Voltage (in volts)

Heating or Cooling Needs

He Backplate

Gas Flow and Pressure Control

Number of Gas Lines

Maximum Gas Flow Per Line (in units of sccm)

Process Pressure Range (include units)

Residual Pressure (include units)

Other Options

Additional Comments

Thank you for your inquiry.

We will be in touch as soon as possible.

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