Ion Beam Sputtering
In Ion Beam Sputtering (IBS), an ion beam source produces ions with sufficient directed energy to sputter the target material. The sputtered neutral particles are then free to be deposited on the substrate.
To produce the ions, Plasmionique systems use an inductively-coupled plasma (ICP) source remote from the process chamber. A biased grid structure accelerates these ions and directs them toward the target. Finally, the ions are neutralised on entry to the process chamber, and proceed to strike the target.
The advantage of IBS is that the energy and flux of the ions are decoupled and may be adjusted independently.
Plasmionique has developed the PLUME Series of plasma sources and ion beam sources for this application.
Please contact us to discuss your application.