Physical Vapour Deposition (PVD) Systems

Physical Vapour Deposition (PVD) is a process where the solid material to be deposited undergoes a physical change (as opposed to a chemical change) prior to deposition.  The solid must be vaporised to enable transport from the source to the substrate and subsequent deposition.  The most common ways to vaporise a solid material are:

  • Sputtering:
    • magnetron plasma sputtering
    • ion beam sputtering
  • Thermal evaporation:
    • resistive heating
    • electron-beam heating
  • Laser ablation:  Pulsed Laser Deposition (PLD)

Plasmionique manufactures systems based on all of these methods.  Our PVD product line includes:

Depending on your application, Plasmionique has a PVD system which can be configured to suit your requirements.

For more versatility, we can custom-design a hybrid system which will combine two or more deposition methods in the same process chamber. Contact Plasmionique for more information.