Chemical Vapor Deposition (CVD), Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Atomic Layer Deposition (ALD)

CVD_ALD_MOCVD_min2

 

Plasmionique manufactures a number of different types of CVD, PECVD and ALD reactors, distinguishing themselves by the type of plasma source and the additional features built in for versatility.

Reactor Type Plasma Source Frequency (MHz) Configuration View brochure
Parallel plate PECVD RF CCP 13.56 biased top plate, grounded substrate inquire
ICP PECVD RF ICP FLARION Series 13.56 volume plasma, RF-biasable substrate FLARION Series Plasma Reactors and Sources (PDF)
Remote ICP PECVD RF ICP PLUME Series 13.56 remote plasma, RF-biasable substrate PLUME Series ICP Plasma and Ion Sources (PDF)
MW-PECVD Microwave MIRENIQUE Series 2450 various (single-mode, multi-mode, S-ECR, remote) MIRENIQUE Series Microwave Plasma Reactors (PDF)
CVD  NON  CVD (PDF)

FEATURES COMMON TO ALL PLASMIONIQUE PECVD REACTOR TYPES

 

 

Substrate Mount Feature      Options
Heating
  • resistive element, up to 800 °C
  • quartz lamps
Cooling
  • for temperature-sensitive samples
  • cooling lines integrated into substrate mount
  • water or chilled fluid, closed or open cycle
Biasing
  • control energy profile of impinging ions
  • RF or DC
Manipulation
  • adjustable source-to-substrate distance for optimum film quality
  • manual or computer-controlled
  • load-lock sample loading available

 

Process environment:

  • Turbomolecular pumping or cryopumping
  • Bypass line with mechanical pump only for high pressure operation
  • Throttling gate valve for automatic pressure control
  • Capacitance manometer for measuring process pressure
  • Gas management system for multiple gases with mass flow controllers, fully automatic and programmable to tailor the gas mix

 

Process control system:

  • LabVIEW® based control system for monitoring and controlling all system variables
  • Intuitive graphic user interface
  • Alarms and interlocks to protect system hardware and warn of unsafe conditions
  • Real-time plotting and data logging
  • Multi-step programming for process recipes