Deposition Materials

PLASMIONIQUE offers a variety of materials for deposition in a wide range of forms, sizes and purities. Materials are available for evaporation or sputtering. Please contact us with your specific requirements. For convenience you may submit a request form.

A selection of available materials is shown here:

Material Name Symbol Material Name Symbol
Aluminum Al Lead Pb
Aluminum Copper Al/Cu Magnesium Fluoride MgF2
Aluminum Oxide Al2O3 Magnesium Oxide MgO
Aluminum Silicon Copper Al/Si/Cu Molybdenum Mo
Aluminum Silicon Al/Si Nickel Ni
Antimony Sb Nickel Chromium Ni/Cr (Nichrome)
Barium Titanate BaTiO3 Silicon (n-type) Si
Bismuth Bi Silicon (p-type) Si
Bismuth Ferrite BiFeO3 Silicon (undoped) Si
Boron Carbide B4C Silicon Carbide SiC
Chromium Cr Silicon Dioxide SiO2
Cobalt Co Silver Ag
Copper Cu Tantalum Ta
Gadolinium Gd Tin Sn
Germanium Ge Titanium Ti
Gold Au Titanium Nitride TiN
Hafnium Hf Tungsten W
Hafnium Oxide HfO2 Vanadium V
Indium In Yttrium Oxide Y2O3
Indium Oxide In2O3 Zinc Zn
Indium Tin Oxide (ITO) In2O3/SnO2, 90/10 wt% Zinc Oxide ZnO
Iridium Ir Zinc Oxide Alumina ZnO/Al2O3 (typically 2% doped)
Iron Fe Zirconium Zr