| Plasma Sources | Deposition systems | Components |                               SPUTTERING SYSTEMS  
  Choosing Your Magnetron  
 


Plasmionique offers 3 generic categories of Planar Magnetron Sputtering Cathodes:

MAGNION-B
A Balanced Magnetron sputtering Source

MAGNION-UI
An Unbalanced Magnetron sputtering source of Type 1

MAGNION-UII
 An Unbalanced Magnetron sputtering source of Type 2

 
 
  Single Magnetrons or Multi-Gun Magnetrons Assembly, Ready for Installation   
 

Single Magnetrons on various types of flanges

   

 

Multigun systems, including hybrid Units with Plasma Sources

 

   

 

 

  
  Differences between different types of Magnetrons  
 

 

The three categories are distinguished by the shape of the magnetic field lines.
The choice of magnetron could influence the deposition process.

Balanced Magnetrons, to a very large extent, confine the plasma to near the cathode surface. This makes them useful as a general purpose sputtering source. They are most suitable for deposition on polymers or substrates, which require to be maintained at low deposition temperature.

Unbalance Magnetrons have some open field lines, which allow electrons to escape from the plasma confinement zone (plasma expansion). The interaction of the expanding plasma with substrate influences the coating characteristics.

Typical  Magnetic field configurations for various types of Magnetron  Cathodes

 
           Balanced Magnetron              Unbalanced (Type 2) Magnetron      Unbalanced (Type 1) Magnetron 

 
  If you are not sure which magnetron is most suitable for your application, feel free to contact us. We could also custom design a magnetron to meet your specific needs.
 
  Magnetron Design with High Target Utilization  
 



The Magnetic Field Configuration also influences the target utilization efficiency.

The design for our Unbalanced Magnetron Cathodes yields high target utilization. For example, for a small 2"cathode (unbalanced Type 2) target utilization rate in excess of 50% is achieved. Larger diameter targets offer much higher utilization efficiency.

  

An example of the target utilization profile for a 2 inch Copper Target, 1/4 inches thick used with magnetron designed for High Target Utilization